川村 みどり Kawamura Midori

研究者情報
職名 教授
所属 地球環境工学科 - 先端材料物質工学コース
学位・学歴・職歴

学位

博士(工学) フェライト合成のためのソフトプロセスに関する研究 1994
担当科目・専門分野等
担当授業科目(学部)
工学系技術者概論, 材料物性I 先端材料物質, 先端材料物質総合工学I 先端材料物質, マテリアル工学実験II マテ, 文献ゼミナール マテ, 先端材料工学 マテ, 薄膜材料工学 マテ, 地球環境工学入門, 先端材料物質工学概論/短期履修
担当授業科目(大学院)
機能電子材料特論 マテ, 材料と物質 創成と評価
専門分野
薄膜電子材料, 無機材料化学, 表面科学
研究テーマ
界面を修飾した新規な薄膜作製法の開発, スパッタリング法で作製した金属窒化物薄膜の評価及び生成過程, 半導体ナノ構造の作製, 極薄い金属薄膜の作製におけるスパッタリング諸因子の影響, 有機EL素子の電子・ホール注入層の開発
研究内容キーワード
薄膜, スパッタリング法, 電気特性, 固体表面分析, ナノ構造, 銀薄膜の安定化
所属学会
日本化学会, 応用物理学会, 電気化学会, 表面技術協会, American Vacuum Society
学術論文等

学術論文

論文名/掲載誌名等     掲載年月
Preparation of Rh Thin Films by Reactive Sputtering and Their Characterizations
Jpn. J. Appl. Phys., 40, 4, 2339‐2402
2001-04
C‐Axis‐Oriented Ru Thin Films Prepared by Sputtering in Ar and O2 Gas Mixture
Jpn. J. Appl. Phys., 40, 12, 6956-6958
2001-12
Effects of Oxygen Gettering and Target Mode Change in Formation Process of Reactively RF Sputtered WOx Thin Films
Vacuum, 66, 3-4, 269‐273
2002-05
Optical and Electrical Properties of Pure Ag and Ag‐Based Alloy Thin Films Prepared by Rf Magnetron Sputtering
Vacuum, 66, 3-4, 501‐504
2002-05
Highly Textured (100)RuO2/(001)Ru Multi‐Layers Prepared by Reactive Sputtering
Jpn. J. Appl. Phys., 41, 11B, 6857-6861
2002-11
Formation Process and Electrical Property of IrO2 Thin Films Prepared by Reactive Sputtering
Jpn. J. Appl. Phys., 41, 1, 213-216
2003-01
Nanowires and Nanorings at the Atomic Level
Phys Rev Lett, 91, 9, 096102-096105
2003-08
Optical and Electrochromic Properties of RF Reactively Sputtered WO3 Films
Solid State Ionics, 165, 1-4, 175-180
2003-12
Formation of Si/Ge Nanostructures at Surfaces by Self-organization
J. Phys. Cond. Mat., 16, 17, S1535-S1551
2004-05
Crystal Orientation Change of Ni Films by Sputtering in Ar-N2 Mixed Gases
Jpn. J. Appl. Phys., 43, 7A, 4361-4362
2004-07
Fabrication of Si/Ge nanorings structure by MBE
Thin Solid Films, 464/465, 185-189
2004-09
Characterization of Ag Oxide Thin Films Prepared Reactive RF Sputtering
Vacuum, 76, 1, 1-6
2004-10
Orientation of Metal Films Deposited by Sputtering Using Ar/N2 Gas Mixtures
Thin Solid Films, 469-470, 491-494
2004-12
Oxidation and Morphology Change of Ru Films Caused by Sputter Deposition of Ta2O5 Films
Jpn. J. Appl. Phys, 44, 4A, 1941-1942
2005-04
Target surface oxide layer formed by reactive sputtering of Ti target in Ar+O2 mixed gas
J. Vac. Sci. Technol. A , 23, 5, 1371-1374
2005-09
Electrical and morphological change of Ag-Ni films by annealing in vacuum
Microelectronic Eng, 82, 3-4, 277-282
2005-12
Effects of the Ar-N2 Sputtering Gas Mixture on the Preferential Orientation of Sputtered Ru Films
Thin Solid Films, 494, 1-2, 204-243
2006-01
Sputter-deposition of Ag films in a nitrogen discharge
Thin Solid Films, 515, 2, 540
2006-04
Preparation of Hydrogen-Containing Ta2O5 Thin Films by Reactive Sputtering Using O2 + H2O Mixed Gas
Jpn. J. Appl. Phys, 46, 2, 7
2007-02
Target-Surface Compound Layers Formed by Reactive Sputtering of Si Target in Ar + O2 and Ar + N2 Mixed Gases
Jpn. J. Appl. Phys., 46, 10A, 6778-6781
2007-10
Comparison of the agglomeration behavior of Ag(Al) films and Ag(Au) films
Microelectronic Engineering, 84, 11, 2476-2480
2007-11
Effects of Substrate Cooling during Sputter Deposition of Hydrogen-Containing Ta2O5 Thin Films in H2O Atmosphere on their Ion Conductivity
Japanese Journal of Applied Physics, 47, 9, 7269〜7271
2008-09
Agglomeration behavior of Ag films suppressed by alloying with some elements
Vacuum, 63, 610〜613
2008-10
Ion conducting properties of hydrogen-containing Ta2O5 thin films prepared by reactive sputtering
Vacuum, 83, 528〜530
2008-10
Formation process of Al2O3 thin films by reactive sputtering
Vacuum, 83, 483〜485
2008-10
Thermally Stable Ag Thin Films Modified with Very Thin Al Oxide Layers
Japanese Journal of Applied Physics, 47, 12, 8917〜8920
2008-12
Ni Oxyhydroxide Thin Films Prepared by Reactive Sputtering Using O2 + H2O Mixed Gas
Japanese Journal of Applied Physics, 48, 01550-1〜015501-4
2009-01
Thermally stable very thin Ag films for electrodes
J. Vac. Sci. Technol. A, 27, 4, 975-978
2009-07
Improved thermal stability of Ag thin films by organic submonolayer at interface with silicon oxide layer
Jpn. J. Appl. Phys., 48, 118002-1〜2
2009-11
Effect of total gas flow rate and sputtering power on the critical condition for target mode transition in Al-O2 reactive sputtering
Vacuum, 84, 629-632
2010-01
Agglomeration suppression behavior and mechanisms of Ag-Cu and Ag-Nb thin films
Vacuum, 84, 657-662
2010-01
Time-dependent variation of the target mode in reactive sputtering of Al-O2 system
Vacuum, 84, 1365-1367
2010-04
Effects of Sputtering Gas Pressure on Electrochtomic Properties of Ni Oxyhydroxide Thin Films Prepared by Reactive Sputtering in H2O Atmosphere
Japanese Journal of Applied Physics, 49, 115802
2010-04
Effect of heat treatment on ion conductivity of hydrated ZrO2 thin films prepared by reactive sputtering using H2O gas
Jpn. J. Appl. Phys., 50, 045804-1〜5
2011-04
Influence of Interface Layers on Ag Thin Film Growth
J. Nanosci. Nanotechnol., 12, 2, 1188-1191
2012-02
Effects of Substrate Temperature on the Ion Conductivity of Hydrated ZrO2 Thin Films Prepared by Reactive Sputtering in H2O Atmosphere
Sol. Energy Mater. Sol. Cells, 99, 160-165
2012-04
Electrochromic properties of NiOOH thin films prepared by reactive sputtering in an H2O atmosphere in various aqueous electrolytes
Sol. Energy Mater. Sol. Cells, 99, 38-42
2012-04
Effects of substrate temperature on electrochromic properties of cobalt oxide and oxyhydroxide thin films prepared by reactive sputtering using O2 and H2O gases
Jpn. J. Appl. Phys, 51, 045501
2012-04
Influence of NiO anode buffer layer prepared by solution on performance of bulk-heterojunction solar cells
Appl. Surf. Sci, 258, 7809-7812
2012-05
Evaluation of ion conductivity of ZrO2 thin films prepared by reactive sputtering in O2, H2O, and H2O+H2O2 mixed gas
Thin Solid Films, 520, 5137-5140
2012-05
Effects of Nb Surface Layer and Ti Interface Layer on Thermal Stability and Electrical Resistivity of Ag Thin Films
Jpn. J. Appl. Phys., 51, 8, 085802
2012-08
Thermal stability and electrical properties of Ag-Ti films and Ti/Ag/Ti films prepared by sputtering
Vacuum, 87, 222-226
2012-10
Effects of substrate temperature on structure and mechanical properties of sputter deposited fluorocarbon thin films
Vacuum, 87, 218-221
2012-10
Growth of Ag thin film on glass substrate with 3-mercaptopropyltrimethoxysilane (MPTMS) interlayer
Journal of Physics: Conference Series, 417, 012004
2013-03
Dye-sensitized solar cells with sol-gel solution processed Ga-doped ZnO passivation layer
Int. J. Electrochem. Sci., 8, 5183
2013-04
Improvement of redox reactions by miniaturizing nanoparticles of zinc Prussian blue analog
Appl. Phys. Lett, 102, 141901
2013-04
Ag thin film on an organic silane monolayer applied as anode of organic light emitting diode
Thin Solid Films, 532, 7
2013-04
Optimization of Surface Layers for Suppression of Agglomeration in Ag Films
Jpn. J. Appl. Phys., 52, 7, 078003
2013-07
Structural properties of zinc oxide nanorods grown on Al-doped zinc oxide seed layer and their applications in dye-sensitized solar cells
Materials, 7, 2522-2533
2014-04
Growth of zinc oxide nanorods using various seed layer annealing temperatures and substrate materials
Int. J. Electrochem. Sci., 9, 2080-2089
2014-04
Thermal stability of Ag Films with Various Interface Layers
Jpn. J. Appl. Phys., 53, 4, 048003
2014-04
Formation of hydrated yttrium oxide and titanium oxide thin films by reactive sputtering in H2O atmosphere and their electrical properties
Jpn. J. Appl. Phys., 53, 5, 068002
2014-05
Effects of Cu doping on nickel oxide thin film prepared by sol-gel solution process
Optik, 125, 2899-2901
2014-06
Structural and optical properties of Cu-, Ag, and Al-doped zinc oxide nanorods
Superlattice. Microst., 75, 455
2014-11
Effects of Li and Cu dopants on structural properties of zinc oxide nanorods
Superlattice. Microst., 77, 101
2015-01
Accelerated coloration of electrochromic device with the counter electrode of nanoparticulate Prussian blue-type complexes
Electrochimica Acta, 163, 288-295
2015-05
A comparative study on the structural properties of ZnO and Ni-doped ZnO nanostructures
Materials Letters, 149, 8-11
2015-06
Electrochromic properties of iridium oxide thin films prepared by reactive sputtering in O2 or H2O atmosphere
J. Vac. Sci. Technol. B , 33, 041204-1-5
2015-07
Effects of Ag doping amount on structural properties of zinc oxide nanostructures
Materials Letters, 153, 85-88
2015-08
Growth behavior of Al-doped zinc oxide microrods with times
Superlattice. Microst., 85, 743-746
2015-09
Preparation of an indium zinc oxide-silver-indium zinc oxide multilayer film and its application in organic light-emitting diodes
Vacuum, 121, 320-322
2015-11
Suppression of property changes in Ag thin films by introducing organic monolayers
Vacuum, 121, 317-319
2015-11
Sequential structural control of open-framework nanoparticles both in dispersion and in film for electrochemical performance tuning
Bull. Chem. Soc. Jpn., 88, 11, 1561-1566
2015-11
Determination of effective growth time for zinc oxide nanorods using chemical solution deposition
Superlattices and Microstructures, 88, 150-153
2015-12
Effects of Ni dopant on structural properties of zinc oxide nanorods
Microelectronic Engineering, 165, 20-22
2016-11
Emission enhancement in indium zinc oxide(IZO)/Ag/IZO sandwiched structure due to surface plasmon resonance of thin Ag film
Applied Surface Science, 389, 906-910
2016-12
Electrochromic properties of sputtered iridium oxide thin films with various film thickness
Journal of Materials Science Research, 6, 44-50
2017-01
Preparation of porous zinc oxide-nickel oxide nanocomposites by facile one-pot solution process
Ceramics International, 43, 1318-1322
2017-01
Morphological characterization of sphere-like structured ZnO-NiO nanocomposites with annealing temperatures
Materials Letters, 186, 364-367
2017-01
Spectroscopic and photoluminescent properties of lndium zinc oxide (IZO) and IZO/Ag/IZO sandwiched film
J. Electron. Mater. , 47, 3873-3879
2017-07
Reactive sputter deposition of nickel oxide thin films at liquid nitrogen temperature
Jpn. J. Appl. Phys., 56, 088004-1-3
2017-08
High-rate sputter deposition of electrochromic nickel oxide thin films using substrate cooling and water vapor injection
J. Vac. Sci. Technol. A, 36, 2, 02C102-1-4
2018-03
Indium-saving effect and physical properties of transparent conductive multilayers
journal of physics; conference series, 987, 012014-1-5
2018-04
Metal nanolayer deposited highly stable Ag thin films and their optical properties
journal of physics; conference series, 987, 012002-1-5
2018-04
Morphological evolution of self-supporting nickel hydroxide nanostructures prepared by a facile wet-chemical method
Thin Solid Films, 654, 49-53
2018-04
Structural and electrochemical properties of nanolayer-stacking structured copper-doped nickel hydroxide
Int. J. Electrochem. Sci. , 13, 7655-7662
2018-08
Photoluminescence enhancement of tris(8-hydroxyquinolinato) aluminum thin film by plasmonic Ag nanotriangle array fabricated by nanosphere lithography
Thin Solid Films, 660, 907-912
2018-08
Optical properties of highly stable silver thin films using different surface metal layers
Thin Solid Films, 660, 730-732
2018-08
Time-resolved photoluminescence study of tris(8-hydroxyquinolinato) aluminum with surface plasmon resonance of Ag nanoparticles
Thin Solid Films, 660, 938-943
2018-08
Morphological and electrochemical properties of bilayered copper oxide nanostructures directly grown on transparent conductive oxides by a simple wet-chemical process
Journal of Electronic Materials, 47, 7296-7300
2018-12

参考論文

論文名/掲載誌名等 掲載年月
Ion conducting properties of hydrogen-containing Ta2O5 thin films prepared by reactive sputtering
Proceedings of the 9th International Symposium on Sputtering & Plasma Processes (ISSP 2007), 261-264
2007-06
Agglomeration behavior of Ag films suppressed by alloying with some elements
Proceedings of the 9th International Symposium on Sputtering & Plasma Processes (ISSP 2007), 339-341
2007-06
Formation process of Al2O3 thin film by reactive sputtering
Proceedings of the 9th International Symposium on Sputtering & Plasma Processes (ISSP 2007), 90-92
2007-06
Time-dependent target mode change for reactive sputtering of Al-O2 system
Proceedings of the 10th International Symposium on Sputtering & Plasma Processes (ISSP 2009), 253-256
2009-07
Al/Ag/Al thin films prepared by sputtering for TFT electrodes
The 16th International Display Workshops (IDW 2009), 735-738
2009-12
Properties of organic light emitting diodes with very thin MoO3 layer and characterization of the MoO3 layer deposited on ITO anode
Proceedings of The 17th International Display Workshops (IDW 2010), 1151-1154
2010-12
低抵抗Ag薄膜の凝集抑制法の検討
北見工業大学機器分析センター年報, 9, 1
2011-03
Effect of substrate temperature on electrochromic properties of cobalt hydroxide thin films prepared by reactive sputtering
Proceedings of MRS Spring Meeting 2011
2011-04
Thermal stability and electrical properties of Ag-Ti films and Ti/Ag/Ti films prepared by sputtering
Proceedings of the 11th International Symposium on Sputtering & plasma Processes, 508-511
2011-07
Effects of substrate temperature on the ion conductivity of yttrium hydroxide thin films prepared by reactive sputtering in H2O atmosphere
Proceedings of the 11th International Symposium on Sputtering & plasma Processes, 337-340
2011-07
Effects of substrate temperature on structure and mechanical properties of sputter deposited fluorocarbon thin films
Proceedings of the 11th International Symposium on Sputtering & plasma Processes, 341-344
2011-07
Improvement of properties of organic light emitting diodes with various hole injection materials
Proceedings of the 18th International Display Workshops, 837-840
2011-12
Surface nanolayers for thermally stable Ag thin films
Proceedings of The 12th International Symposium on Sputtering & Plasma Processes, 103-106
2013-07
Effects of substrate temperature and pH of aqueous electrolytes on the electrochromic properties of reactively sputtered tungsten oxide thin films
Proceedings of The 12th International Symposium on Sputtering & Plasma Processes, 161
2013-07
スマートウィンドウ用電極材料のスパッタ成膜技術
ケミカルエンジニアリング, 58, 811-817
2013-11
反応性スパッタリングにおけるターゲットモード変化について—容器壁によるゲッタリングの影響—
日本真空協会誌 , 57, 1-8
2014-01
科学研究費
研究課題・他 取得年月
極薄表界面層を有する高安定性銀薄膜の作製
極薄表界面層を有する高安定性銀薄膜の作製
スマートウインドウ用ポーラス水酸化物薄膜の開発
有機単分子膜をナノ保護膜として活用した銀薄膜の環境耐性
スマートウインドウ用ポーラス水酸化物薄膜の開発
有機単分子膜をナノ保護膜として活用した銀薄膜の環境耐性
スマートウインドウ用ポーラス水酸化物薄膜の開発
有機単分子膜をナノ保護膜として活用した銀薄膜の環境耐性
高安定銀薄膜の実用化を目指した光学特性評価
高安定銀薄膜の実用化を目指した光学特性評価
高安定銀薄膜の実用化を目指した光学特性評価
受賞
2004 日本化学会北海道支部奨励賞
社会活動
H19-H25 北見市男女共同参画審議会委員
H20-H22 日本化学会北海道支部幹事
H22- 北見市情報公開・個人情報保護審査会委員
H22- 電気化学会北海道支部常任幹事
H27- 表面技術協会評議委員